SCANLAB collaborates closely with each customer to select application-optimized optical components from an extensive palette of mirrors and focusing optics.

SCANLAB offers deflection mirrors with diverse apertures, substrate materials and high-performance coatings. The scan system's mirrors are selected to meet application-specific requirements for wavelength, laser power and dynamics. Particular attention is paid to high reflectivity, flatness and robustness of the mirrors, and good positioning dynamics in conjunction with the galvanometer scanners.

Whereas objectives are mounted at the scan system's beam exit, varioSCAN focusing units are installed to precede the scan system's deflection mirrors. The focusing optic's type and focal length (or conjugate) are selected to meet application-specific requirements for wavelength, laser power, spot size, image field size and working distance.

F-Theta objectives achieve flat image fields and offer high precision along with freedom from dynamics limitations. Short-focal-length F-Theta objectives are capable of short working distances, which allows creation of very compactly-dimensioned systems. SCANLAB offers an extensive range of F-Theta and flat field objectives (including telecentric objectives). Customer-specified components are also possible.

Alternatively, varioSCAN focusing units can focus onto a flat image field. An RTC® board adjusts the varioSCAN's focal length for each position of the deflection mirrors such that the laser focus always remains in the desired plane. The same process can be applied to position the focus along the beam axis, thus enabling true 3D laser processing of materials. SCANLAB offers varioSCAN optics for all typical wavelengths.

Depending on the optical configuration, processing within large image fields and at high laser powers is possible. And large working volumes are achievable by combining a varioSCAN unit with an F-Theta objective.

To tackle a range of specialized tasks, SCANLAB offers scan mirrors with non-typical geometries and substrate materials, as well as focusing optics for non-standard beam shapes. Also available is a system for reproducing masks at variable positions in the image field. On request, we collaborate with customers to develop specific solutions.

Scan systems exposed to contamination risk during materials processing can be equipped with a protective window.